| 摘要 |
PCT No. PCT/JP85/00064 Sec. 371 Date Oct. 15, 1985 Sec. 102(e) Date Oct. 15, 1985 PCT Filed Feb. 15, 1985 PCT Pub. No. WO85/03803 PCT Pub. Date Aug. 29, 1985.A process for forming a film, characterized in that, in forming a film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs are arranged in a line and in parallel and substrates are arranged on both sides of said electrode pair row approximately in parallel to the electrode pair row. According to the process, damage of the film due to plasma can be reduced, a shield on the back of the RF electrode is not needed, and a film of a large area can be obtained.
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