| 摘要 |
<p>The invention relates to visible-laser deposition reactions of metal containing oxyhalide and carbonyl vapors, such as, chromyl chloride vapor, CrO2Cl2, or cobalt carbonyl, Co2(CO)8, for direct writing of metal containing opaque patterns on various substrates (Si, SiO2, GaAs and glass). Deposition at low laser power is by photolyses of adsorbed reactant molecules. Higher powers initiate deposition photochemically and continue it with a combined photolytic/pyrolytic reaction, simultaneously inducing a solid-phase conversion of the deposited film. Mixed Cr2O3/CrO2 or cobalt thin films of 1-nanometer to several-micrometer thickness, as well as 1-millimeter-long single crystals of Cr2O3 or cobalt, can be grown with this process, the former at rates up to 3 mu m/s. Thin chromium oxide films produced in this manner are strongly ferromagnetic.</p> |
