Process for producing a metallic pattern.

摘要

The present invention provides a method for forming a metal image in which a resist film is provided at an image portion and then etching processing is performed to thereby form the metal image comprising the steps of: 1) forming an image comprising concave surface portions (4) on a metal surface (1); 2) forming a resist film (5) on the metal surface (1); and 3) exposing the resist film (5) to such an extent that at the concave portions (4) of the resist film (5) is not made wholly soluble.