| 摘要 |
PURPOSE:To improve the adhesiveness between a can and substrate and to suppress wrinkling during vapor deposition by electrostatically charging the substrate before a magnetic layer is formed. CONSTITUTION:An aperture 8 is provided to a mask 5 for limiting the incidence of vapor flow. The aperture 8 plays the role of spreading the reflected electrons of an electron beam 7 to the surface of the substrate 1. The electron beam may be provided for the electrostatic charge of the substrate 1 as well without utilizing the reflected electrons of the electron beam 7. High-polymer molding of a polyimide, polyamide, PE terephtalate, etc., having <=100mum film thickness are adequately selected for the substrate 1. The wrinkling is of a problem in the case of, above all, the thin films of <=30mum. The cylindrical can 2 is made of a metal can be controlled in temp. by a heat medium. Electrostatic attraction is thereby acted between the electrostatically charged substrate 1 and the can 2, by which the adhesiveness is extremely improved and the wrinkling is suppressed even without increasing the tension of the substrate.
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