CHEM-MECH POLISHING METHOD FOR PRODUCING COPLANAR METAL/INSULATOR FILMS ON A SUBSTRATE,申请号EP19860110461-传众专利搜索

发明名称	CHEM-MECH POLISHING METHOD FOR PRODUCING COPLANAR METAL/INSULATOR FILMS ON A SUBSTRATE
摘要
申请公布号	EP0223920(A3)	申请公布日期	1987.09.23
申请号	EP19860110461	申请日期	1986.07.29
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	BEYER, KLAUS DIETRICH;GUTHRIE, WILLIAM LESLIE;MARKAREWICZ, STANLEY RICHARD;MENDEL, ERIC;PATRICK, WILLIAM JOHN;PERRY, KATHLEEN ALICE;PLISKIN, WILLIAM AARON;RISEMAN, JACOB;SCHIABLE, PAUL MARTIN;STANDLEY, CHARLES LAMBER
分类号	H01L21/3205;H01L21/304;H01L21/3105;H01L21/3213;H01L21/768;(IPC1-7):H01L21/306;H01L21/60	主分类号	H01L21/3205
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