发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To obtain a positive type hotosensitive lithographic printing plate assuming no halftone red during development, leaving no stain after erasure and having high sensitivity by forming a photosensitive layer contg. specified compounds on a support. CONSTITUTION:A photosensitive layer of a photosensitive composition contg. a compound producing an acid by exposure and a compound having one or more imino groups (-C-C=N-C-) which are decomposed by the acid is formed on a support. When an alkali-soluble resin such as cresol-formaldehyde resin or phenol-cresol-formamide resin is used in the photosensitive composition, the chemical resistance and solubility of the composition are improved. the preferred amount of the resin used is 30-90wt%, especially 50-85wt% of the total amount of the solid substances in the composition. A sensitizer for enhancing the acid producing effect, a print-out material, a surfactant contg. fluorine and a plasticizer may be added to the photosensitive composition.
申请公布号 JPS62215946(A) 申请公布日期 1987.09.22
申请号 JP19860058149 申请日期 1986.03.18
申请人 MITSUBISHI CHEM IND LTD;KONISHIROKU PHOTO IND CO LTD 发明人 URANO TOSHIYOSHI;TOMIYASU HIROSHI;MAEDA YOSHIHIRO;NAKAI HIDEYUKI;GOTO SEI;SASA NOBUMASA
分类号 G03C1/72 主分类号 G03C1/72
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