| 摘要 |
PURPOSE:To easily form a metallic nitride film by shielding an N2 plasma flame from the atm. by other gaseous N2 at the time of blowing the plasma jet of N2 to the surface of Ti, etc., and forming the nitride film of TiN, etc. CONSTITUTION:The surface of a metallic material 1 such as Ti, Al, Si or Zr as the work for a surface treatment is shielded from the atm. by maintaining the same in an N2 gaseous atmosphere 2. Gaseous N2, 5 is then introduced into a water-cooled Cu nozzle 3 of a plasma generator provided with an electrode 4 and a DC voltage is impressed between the electrode 4 and the Cu nozzle 3 to ionize the gaseous N2, 5 and to eject the plasma jet 6. The plasma jet 6 of a high temp. contg. such N2 ions is blown to the surface of the metallic material 1, by which a ceramic layer 7 of TiN, AlN, Si3N4, ZrN, etc., having high toughness and excellent resistance to corrosion, wear and heat is easily formed.
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