发明名称 HIGH-FREQUENCY INDUCTIVE COUPLING PLASMA/MASS ANALYZER
摘要 PURPOSE:To enhance the sensitivity of detection, by placing the tip of a sampling nozzle in that of a plasma torch. CONSTITUTION:The tip of a sampling nozzle 5' is placed in that (that of an outermost chamber 1a, strictly speaking) of a plasma torch 1 so that ions in plasma 4 are pulled out of the central portion of the plasma into a skimmer 12 through the sampling nozzle. The ions pulled into the skimmer 12 are detected by a pole 17. After a signal resulting from the detection is amplified by a secondary electron multiplier 20, the signal is sent to a signal processing section 21 so that the analyzed value or the like of a measured element or the like contained in a sample is finally given.
申请公布号 JPS62208535(A) 申请公布日期 1987.09.12
申请号 JP19860051678 申请日期 1986.03.10
申请人 YOKOGAWA ELECTRIC CORP 发明人 KAWANAKO HIDEKI
分类号 G01N27/62;H01J49/04;H01J49/10 主分类号 G01N27/62
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