PHOTOCHEMICAL VAPOR GROWTH DEVICE

摘要

PURPOSE:To permit efficient film deposition of a substrate for a long period of time by making the flow of an inert gas to be introduced into a light source chamber laminator to prevent the deposition of the resulted product of reaction and decomposition to a light tansmission window and to suppress the decrease of light intensity. CONSTITUTION:A reactive gas is introduced from a reactive gas introducing port 4 into a reaction chamber 1. On the other hand, the inert gas is introduced by a purge gas introducing port 12 in a laminar state into the light source chamber 7 along a partition wall 6. The pressure in the chamber 7 is maintained slightly higher than the pressure of the reaction chamber 1 in this stage. The light from the light source 8 is introduced through an aperture of a mesh 11 provided to the wall 6 into the reaction chamber 1 and the resulted product of reaction deposits on the substrate 3. The reverse diffusion of the reactive gas into the light source chamber 7 in prevented and the deposition to the light transmission window 9 is suppressed.