发明名称 GAS INTRODUCING DEVICE FOR VACUUM EQUIPMENT
摘要 PURPOSE:To enable a metallic wall to be baked without deteriorating the degree of vacuum, by setting, on the atmospheric side of the metallic wall, a chamber capable of undergoing vacuum exhaust during a period when the metallic wall is baked. CONSTITUTION:If a three-way valve 6 is set in a condition as shown in the figure during a step of baking, a preliminary exhaust chamber 5 is subjected to vacuum exhaust by means of a rotary pump 7. A gas introducing device consisting of a silver pipe 2 and a heater 3 is baked together with a vacuum container 1 in this condition. When introduction of gas is performed after attaining high vacuum, the three-way valve 6 is turned in the direction shown by an arrow so as to set the preliminary exhaust chamber 5 at the atmospheric pressure, then the heater 3 is heated by means of a DC power supply 4 so that the silver pipe 2 is set at a predetermined temperature before introducing oxygen gas. Any undesirable introduction of gas from a gas introducing metallic wall can be prevented from taking place during a backing process and any out-gas used to be generated out of an inner wall on account of insufficient effect of degassing treatment can be also reduced well.
申请公布号 JPS62190640(A) 申请公布日期 1987.08.20
申请号 JP19860030820 申请日期 1986.02.17
申请人 HITACHI LTD 发明人 YONEDA SHOZO;TODOKORO HIDEO
分类号 H01J37/073;H01J37/18 主分类号 H01J37/073
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