| 摘要 |
PURPOSE:To supply a developer sufficiently to the overall film exposure surface by making a developer path thinner as it comes to the contact part with an electrophotographic film. CONSTITUTION:After a developer 136 enters to the path 104 from a squize air supply port 108, it drops by self weight in the path 104, and comes to a developing chamber 136 through a squize air inflow port 100. During the travel the passing sectional area and height dimension gradually decrease, and therefore the flow of the developer 36 is not interrupted halfway. The developer sufficiently spreads in the transverse direction, and is supplied to the exposure surface of the electrophotographic film, thereby executing the secure development. |
