PRODUCTION OF RADIATION-RESISTANT POLYMER COMPOSITION

摘要

PURPOSE:To obtain a polymer composition having excellent radiation resistance and freed of blooming of additives, by adding a coumarone/indene oligomer to a polymeric material and subjecting the mixture to treatment for generating free radicals. CONSTITUTION:A coumarone/indene oligomer obtained by copolymerizing a coumarone with an indene is added to a polymeric material. This mixture is subjected to treatment for generating free radicals to polymerize the coumarone-indene oligomer in the polymeric material. The amount of the coumarone/indene oligomer added to the polymeric material is preferably at least 5pts. per 100pts.wt. polymeric material in order to impart higher radiation resistance to the produced composition. Examples of means for subjecting the mixture to treatment for generating free radicals after said materials are kneaded include heating of the mixture after adding an organic peroxide thereto and irradiation of the mixture with an ionizing radiation such as beta-rays, gamma-rays or electron beams.