发明名称 |
Method for carbon film production. |
摘要 |
<p>A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas.</p> |
申请公布号 |
EP0231894(A1) |
申请公布日期 |
1987.08.12 |
申请号 |
EP19870101271 |
申请日期 |
1987.01.30 |
申请人 |
KABUSHIKI KAISHA MEIDENSHA |
发明人 |
WATANABE, MISUZU |
分类号 |
C23C14/00;C23C14/06;(IPC1-7):C23C14/22;C23C14/24;C23C14/34 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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