发明名称 Method for carbon film production.
摘要 <p>A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas.</p>
申请公布号 EP0231894(A1) 申请公布日期 1987.08.12
申请号 EP19870101271 申请日期 1987.01.30
申请人 KABUSHIKI KAISHA MEIDENSHA 发明人 WATANABE, MISUZU
分类号 C23C14/00;C23C14/06;(IPC1-7):C23C14/22;C23C14/24;C23C14/34 主分类号 C23C14/00
代理机构 代理人
主权项
地址