发明名称 |
Apparatus for ion beam work |
摘要 |
This invention discloses an ion beam work apparatus which comprises ion mean radiation means for focusing and radiating an ion beam extracted from an ion source to a target put on a moving mechanism, and scanning two-dimensionally the radiation position; secondary particle detection means for detecting the secondary particles generated from the target upon radiation of the ion beam; and superposition-display means for superposing the secondary particle image with a different kind of image containing such information that is not contained in the secondary particle image, and displaying the resulting image; and which can accurately position the beam radiation position to lower wiring layers of the target such as a semiconductor device that can not be observed by the secondary particle image obtained by scanning the focused ion beam.
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申请公布号 |
US4683378(A) |
申请公布日期 |
1987.07.28 |
申请号 |
US19850754930 |
申请日期 |
1985.07.15 |
申请人 |
HITACHI, LTD. |
发明人 |
SHIMASE, AKIRA;YAMAGUCHI, HIROSHI;HARAICHI, SATOSHI;MIYAUCHI, TATEOKI |
分类号 |
H01J37/28;G01N23/225;G21K5/04;H01J37/22;H01J37/30;H01J37/304;H01J37/305;H01L21/027;H01L21/265;H01L21/30;H01L21/66;(IPC1-7):H01J37/304;H01J37/302 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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