发明名称 DEVICE FOR FORMATION OF DEPOSIT FILM
摘要 PURPOSE:To form a deposit film with large space and even characteristics while saving energy by a method wherein the titled device is provided with multiple gas blow-out ports feeding mixtures of gaseous raw material and gaseous halogen base oxidizer while at least two of them are arranged to feed mixtures with different compositions phasing them according to the turning direction of substrate. CONSTITUTION:A substrate 101 is driven in the circumferential direction by an axle 113 and a motor 114 connected thereto. A gaseous raw material is led in an inner reaction tube 102 from a lead-in port 104. The halogen base oxidizer led in the inner reaction tube 102 from the leading-in port 104 and another gaseous raw material led in an outer reaction tube 103 from another leading-in port 105 are mixed with each other near the outlet of reaction tubes to produce a precursor. The produced precursor collides with a base for filming over the substrate 101. In such a constitution, the halogen base oxidizer and the material gas with different composition are respectively led in reaction tubes respectively through the intermediary of leading-in ports 108 and 109 to be mixed with each other near the outlet of reaction tubes for producing precursor.
申请公布号 JPS62165321(A) 申请公布日期 1987.07.21
申请号 JP19860005951 申请日期 1986.01.15
申请人 CANON INC 发明人 ISHIHARA SHUNICHI;HIROOKA MASAAKI;HANNA JUNICHI;SHIMIZU ISAMU
分类号 H01L31/04;H01L21/205 主分类号 H01L31/04
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