发明名称 PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain a photosensitive lithographic plate enhanced in sensitivity without losing any balance among various performances by forming a photosensitive layer containing an o-quinonediazide compound, an alkali-soluble resin, and a lactone compound on a support. CONSTITUTION:The photosensitive layer formed on the support contains the o-quinonediazide compound, the alkali-soluble resin, and the lactone compound. The o-quinonediazide to be used is, preferably, such as the ester of a hydroxyl compound with benzoquinone-1,2-diazidosulfonic acid or naphthoquinone-1,2- diazidosulfonic acid, and it is used, preferably, in an amount of 5-80wt% of the total solids. As the hydroxyl compound, phenol formaldehyde resin, cresol formaldehyde resin, or the like are preferable, and these resins are preferable, too, as the alkali-soluble resin. The alkali-soluble resin is contained, preferably, in an amount of 30-90wt% of the total solids, and it is preferred to add the lactone resin, preferably, in an amount of 0.05-20wt% of the total solids.
申请公布号 JPS62151846(A) 申请公布日期 1987.07.06
申请号 JP19850292205 申请日期 1985.12.26
申请人 MITSUBISHI CHEM IND LTD;KONISHIROKU PHOTO IND CO LTD 发明人 TOMIYASU HIROSHI;URANO TOSHIYOSHI;SASA NOBUMASA;YAMAMOTO TAKESHI
分类号 G03C1/00;G03C1/72;G03F7/00;G03F7/004 主分类号 G03C1/00
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