| 摘要 |
PURPOSE:To enable the projection exposure of high accuracy to a material substrate having a diameter over 6 inches by arranging plural triangular prisms between a double telecentric projection lens system and the material substrate. CONSTITUTION:Triangular prisms 8 are arranged between a double telecentric projection lens system 4 and a back focus. At this time, the triangular prisms 7 and 8 are laid at right angles to the triangular prisms 5 and 6. As a result, a diameter phid of a light flux of the light emitted from the double telecentric projection lens system 4 can be projected with an expanded projection area diameter phiD on a material substrate 9. Even if the projection area diameter phiD on the material substrate 9 exceeds 6 inches, projection exposure is possible without depending on contact exposure. |
