发明名称 DISPOSITIVO A SEMINCONDUTTORE AVENTE UN SENSORE DI PRESSIONE E PROCEDIMENTO PER LA SUA FABBRICAZIONE
摘要 The present invention relates to a semiconductor device having a semiconductor pressure sensor, which includes a heavily-doped semiconductor layer having a predetermined impurity concentration gradient and formed at the bottom of a diaphragm (membrane portion). Owing to the presence of this semiconductor layer, a flat diaphragm is formed, and a semiconductor pressure sensor of high precision is provided.
申请公布号 IT1170061(B) 申请公布日期 1987.06.03
申请号 IT19830024374 申请日期 1983.12.23
申请人 HITACHI LTD. 发明人 ISAO SHIMIZU;KAZUJI YAMADA
分类号 G01L9/00;H01L29/84;(IPC1-7):H01L/ 主分类号 G01L9/00
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