| 摘要 |
PURPOSE:To correct the rotation and the elongation and contraction rates of a transfer pattern by controlling the conjunction of electrons by superposing the components of an electric field and a magnetic field displaced from uniform distributions in a transferring method for an electron beam. CONSTITUTION:A z-axis, x-axis and y-axis are set, and the distribution of an electric field phi' is set to the state that an electric field E1z displaced in the uniformity of a uniform electric field E0 is superposed on the field E0 such as phi'=E0+E1z. If E0 is set to E0=80kV/50mm, E1=10V/50mm/50mm when observing electrons emitted from the position of w=x=10mm of a photoelectric mask 1 while the distance z0 between the mask 1 and a wafer 2 is z0=50mm, x-axis elongation and contraction exemplified in the drawing and the rotation in y-axis occur on the orbit of the electrons emitter perpendicularly to the mask 1. Thus, the x-axis elongation and contraction and the rotation in y-axis occur at the focal position of the beam in the electric and magnetic fields superposed in this manner, the orbit of the electron beam 3 is controlled by selecting the electric field and the magnetic field to obtain the rotation and the elongation and contraction rates necessary to correct a transferring pattern 21.
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