| 摘要 |
PURPOSE:To obtain an electrophotographic sensitive body having superior electrostatic chargeability, low residual potential, high sensitivity in a wide wavelength region and superior environmental resistance by forming a laminate consisting of amorphous silicon and microcrystalline silicon as a photoconductive layer. CONSTITUTION:The 1st a-Si layer 106, a muC-Si layer 104 and the 2nd a-Si layer 105 are successively laminated on a support 101 to form a photoconductive layer 103. The 2nd a-Si layer 105 contains at least one among C, O and N. The 1st a-Si layer 106 contains an atom for controlling the type of conductivity and at least one among C, O and N. The 1st a-Si layer 106 is composed of the 1st region 107 and the 2nd region 108 each having photoconductivity. The concns. of the atom for controlling the type of conductivity and at least one among C, O and N in the 1st region 107 are higher than those in the 2nd region 108 and the atoms in the 1st region 107 have ununiform concn. distributions in the thickness direction. |
