TARGETS FOR CATHODE SPUTTERING

摘要

"TARGETS FOR CATHODE SPUTTERING" Oxide-ceramic targets which can be used in magnetically enhanced cathode sputtering and which are based on hot-pressed indium oxide/tin oxide mixtures, which have a density of at least 75% of the theoretical density and which have been diminished to such an extent in the oxygen content compared with the stoichiometric composition that they have an electrical conductivity which corresponds to a specific resistance of 0.6 to 0.1 .OMEGA.. cm can be prepared by compressionmolding the metal oxide mixture in a reducing atmosphere under a pressure of 50 to 600 kg/cm2 and at a temperature of 850 to 1,000.degree.C. The targets can be used in direct-voltage sputtering.