发明名称 NEGATIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To prevent accumulation of electrostatic charge and to enable a micropattern to be formed without any slip of its position by partially converting polyvinylbenzyl chloride into quaternary ammonium, reacting it with lithium.tetracyanoquinodimethane (TCNQ) salt to partially form a salt type complex, and using the electrically conductive negative type resist composition thus obtained. CONSTITUTION:Polyvinylbenzyl chloride having a molecular weight of about 40,000, and a dispersion degree of 1.5 is dissolved in 1,4-dioxane, triethylamine is added, stirred with heating until the cloudy solution becomes transparent, and 60% of the chloromethyl groups of the polymer is converted into trimethylammonium groups. The ethanol solution of this polymer and a solution of lithium-TCNQ are mixed and stirred in a nirogen gas stream at room temperature to convert all the cation groups into the TCNQ salt complex. A silicon substrate is coated by the spin coating method with a cyclohexanone solution of this negative type resist material thus prepared, and then it is baked.
申请公布号 JPS62113139(A) 申请公布日期 1987.05.25
申请号 JP19850254002 申请日期 1985.11.13
申请人 FUJITSU LTD 发明人 KAWASAKI YOKO;YONEDA YASUHIRO;SAITO KAZUMASA;MIYAGAWA MASASHI
分类号 G03C1/00;G03F7/004;G03F7/038 主分类号 G03C1/00
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