| 摘要 |
PURPOSE:To quantitatively measure film thickness, chemical compsn. and crystal compsn. by irradiating an X-ray on a plating film formed by continuous plating on a metallic strip at an angle at which the X-rays penetrates the film and detecting the resultant characteristic X-rays and diffracted X-rays. CONSTITUTION:The metallic strip is put into a plating cell 2 to form the plating film 1. The X-ray is irradiated from a continuous X-ray source 3 on the film layer 1 at the angle theta deg. at which the X-ray penetrates the film. The resultant X-ray is detected with two units of solid state detectors 4, 5 and the outputs therefrom are inputted via preamplifiers 6, 6 and a multi-channel analyzer 7 to computers 8, 9. The chemical compsn. of the film is analyzed by the solid state detector 4 from the exit angle theta deg. of the characteristic X-ray obtd. in this stage. The film thickness and crystal compsn. are analyzed by the solid state detector 5 from the exit angle theta deg.. Since the X-ray is irradiated on the film at the angle at which the X-ray penetrates the film in the above-mentioned manner, the plating film on the strip is quickly and quantitatively determined online with high accuracy.
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