发明名称 |
Semiconductor laser element suitable for production by a MO-CVD method |
摘要 |
A semiconductor laser element includes a first cladding layer of first conductivity type provided on a semiconductor substrate of the first conductivity type; a current blocking layer of a second conductivity type provided on the first cladding layer having a stripe groove from which the first cladding layer and is exposed at the bottom thereof; a light guide layer of the first conductivity type provided covering the current blocking layer, the stripe groove, and the first cladding layer exposed from the groove; an active layer provided on the light guide layer curved in the neighborhood of the stripe groove, whose refractive index is larger than that of the light guide layer; and a second cladding layer of the second conductivity type provided on the active layer, whose refractive index is smaller than that of the active layer.
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申请公布号 |
US4667332(A) |
申请公布日期 |
1987.05.19 |
申请号 |
US19850700017 |
申请日期 |
1985.02.08 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MIHASHI, YUTAKA;NAGAI, YUTAKA |
分类号 |
H01S5/00;H01S5/223;(IPC1-7):H01S3/19 |
主分类号 |
H01S5/00 |
代理机构 |
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地址 |
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