发明名称 Semiconductor laser element suitable for production by a MO-CVD method
摘要 A semiconductor laser element includes a first cladding layer of first conductivity type provided on a semiconductor substrate of the first conductivity type; a current blocking layer of a second conductivity type provided on the first cladding layer having a stripe groove from which the first cladding layer and is exposed at the bottom thereof; a light guide layer of the first conductivity type provided covering the current blocking layer, the stripe groove, and the first cladding layer exposed from the groove; an active layer provided on the light guide layer curved in the neighborhood of the stripe groove, whose refractive index is larger than that of the light guide layer; and a second cladding layer of the second conductivity type provided on the active layer, whose refractive index is smaller than that of the active layer.
申请公布号 US4667332(A) 申请公布日期 1987.05.19
申请号 US19850700017 申请日期 1985.02.08
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MIHASHI, YUTAKA;NAGAI, YUTAKA
分类号 H01S5/00;H01S5/223;(IPC1-7):H01S3/19 主分类号 H01S5/00
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