发明名称 PRODUCTION OF QUARTZ GLASS
摘要 PURPOSE:To remarkably improve optical quality of a quartz glass, by heating glass material or glass precursor at 1,500-2,200 deg.C in the synthesis of a quartz glass by sol-gel process and maintaining the glass, etc., to the temperature for a specific period. CONSTITUTION:A sol solution containing a silicon compound is gelatinized and dried and the pores of the produced dry gel are closed to obtain a glass material or glass precursor. The glass material or glass precursor is heated at 1,500-2,200 deg.C and maintained to the temperature for a specific interval to obtain a quartz glass. A quartz glass having extremely excellent optical quality and usable as a substrate or photo-mask and an optical fiber preform can be produced in large quantities by this process.
申请公布号 JPS62105936(A) 申请公布日期 1987.05.16
申请号 JP19860101347 申请日期 1986.05.01
申请人 SEIKO EPSON CORP 发明人 MIYASHITA SATORU;KANBE SADAO;TOKI MOTOYUKI;TAKEUCHI TETSUHIKO;KITABAYASHI HIROHITO
分类号 G02B6/00;C03B8/02;C03B19/12;C03B20/00;C03B37/016 主分类号 G02B6/00
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