| 摘要 |
A beam exposure apparatus is set forth comprising a mechanism for displacing an object being irradiated. This mechanism involves a drive mechanism. The drive mechanism may be rigidly connected to a wall of the apparatus, and a secondary shaft of the drive mechanism is connected by a friction coupling to a part of the object carrier which is to be positioned. The drive mechanism is driven by a direct current drive motor which is powered by a pulsed direct current. The object can be thus positioned with a step accuracy of approximately 0.2 micron. Such positioning can be measured with this accuracy be means of an inductive position detector.
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