| 摘要 |
PURPOSE:To obtain the titled image having a high durability against an oxygen plasma by incorporating a mixture (A) of a condensate of a specific silicon contg. phenol and a formaldehyde and a novolak resin, and (B) a compd. contg. a quinone diazide compd. to the titled composition. CONSTITUTION:The titled composition contains the mixture (A) of the condensate of the silicon contg. phenol shown by the formula and the formaldehyde and the novolak resin, and (B) the compd. contg. the quinone diazide compd. In the formula, R1-R3 are each a lower alkyl or a hydroxyphenyl group, R4 is a hydrogen atom, an lower alkyl, a lower trialkyl silyl group or a hydroxyl group, the mixing ratio of the condensate of the silver contg. phenol and the formaldehyde to the novolak resin is preferably (1:1)-(1:10) by the weight basis. The compounding ratio of the component (a) and the component (B) is selected to be <=55wt.pts. the component (A) per 10wt.pts. the component (B). If the component (A) is >=100wt.pts., the fidelity of the obtd. mask pattern of the image reduces and the transfer property of the obtd. image decreases. |
