发明名称 |
Semiconductor etching apparatus with magnetic array and vertical shield. |
摘要 |
<p>In an apparatus for etching a large semiconductor wafer the etch rate and uniformity of etching at the edges is improved by using an array of magnets behind the collector plate to form a double ring of plasma and using a grounded shield ring with perforations to pass gases. The shield ring extends both above and below the surface of the wafer being etched.</p> |
申请公布号 |
EP0215679(A2) |
申请公布日期 |
1987.03.25 |
申请号 |
EP19860307175 |
申请日期 |
1986.09.17 |
申请人 |
VARIAN ASSOCIATES, INC. |
发明人 |
CHOW, ROBERT;DOWNEY, STEVE D. |
分类号 |
C23F1/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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