| 摘要 |
PURPOSE:To accurately and readily position the prescribed pattern by initially scanning the prescribec region by low magnification to search the position of the prescribed pattern, and then positioning at the home position at high magnification. CONSTITUTION:A semiconductor wafer W is positioned and placed on an X-Y stage 2, and fed to a home position of a scan electron microscope 1. An electron beam 4 focused by an electron lens system 5 emitted from an electron gun 3 is deflected by low magnification of several 100 to 1,000 times to scan the region, thereby searching the position of the prescribed pattern. Then, a calcula tion controller 12 transmits a magnification command of the magnificatino higher than that to a scan controller 14 to raise the scanning magnification of the beam 4, for example, to approx. several 1,000 times to scan the region of the wafer W positioned so that the center of a positioning mark M coincides with that of a screen 18 of a display CRT. As a result, the enlarged mark M corresponding to the scanning magnification is displayed on the screen 18. |
