发明名称 Electroless copper plating bath and method
摘要 An electroless copper plating bath is prepared by adding both a metal-cyano-complex used as a stabilizer and an agent for complexing the metal of the metal-cyano-complex to an electroless copper plating bath containing cupric ion, an agent for complexing the cupric ion and a reducing agent, and an article to be plated is immersed in the bath.
申请公布号 US4650691(A) 申请公布日期 1987.03.17
申请号 US19840653848 申请日期 1984.09.24
申请人 C. UYEMURA & CO., LTD. 发明人 KINOSHITA, AKEMI;ARAKI, KEN;NAWAFUNE, HIDEMI;MIZUMOTO, SHOZO
分类号 C23C18/40;(IPC1-7):C23C18/40 主分类号 C23C18/40
代理机构 代理人
主权项
地址