| 摘要 |
PURPOSE:To arrange a mark at many positions or an ideal position on a reticule and to improve the accuracy of the reticule alignment and a step alignment by sharing respective forming areas with the mark for the reticule alignment and the mask for the step alignment. CONSTITUTION:At a reticule R, a rectangular pattern area PA where the circuit pattern to be exposed, etc., are drawn, and a mark area MA where marks RY, RX and RT for reticule alignment are provided at the peripheral three places are formed. The mark area MA is a square area with the size of about 5mmX5mm on the reticule R, at the central position of the (y) direction, the mark RY, which extends in a line manner in the (x) direction, is formed, the mark area MA is formed as the light transmitting part of the reticule R, and at the periphery, the shading layer, where the chrome, etc., are evaporated, exists. The central part of the line-shaped mark RY is divided into two by a step alignment mark area SA as the second area, and the mark area SA is the dimensions of the angle of 250mumX250mum on the reticule R. |
