发明名称 PRODUCTION OF THIN FILM FOR PHOTOMASK PROTECTING RESIN
摘要 PURPOSE:To obtain a uniform and a good thin film with a high production efficiency by extending a cellulose ester solution on a smooth substrate followed by evaporating a solvent from said solution, thereby forming the thin film having the uniform thickness on the substrate, and then by sticking the obtd. thin film on a supporting frame and separating it from the substrate with wetting it. CONSTITUTION:The cellulose ester is used as the thin film forming material. The thin film 1 is formed by extending the polymer solution composed of the prescribed cellulose ester mainly on the smooth glass plate 2 and by allowing to stand to drying. And then, the upper surface of the supporting frame 4 composed of a hard aluminium is coated with an epoxy type adhesives and the surface of the prescribed thin film 1 is sticked on said upper surface of the frame 4 followed by cutting the thin film 1 along an outer surroundings of the supporting frame 4. And the prescribed glass plate 2 is put on an opening part of an upper portion of a stainless vessel 5 which contains a warm water 6 therein so as to be the surface 1 of the thin film to down ward, thereby wetting the thin film. And then the prescribed thin film 1 is removed from the vessel followed by separating the thin film 1 from the glass plate 2 with the supporting frame 4. The separated thin film 1 is dried to obtain the thin film suitable to the photomask protecting use.
申请公布号 JPS6239859(A) 申请公布日期 1987.02.20
申请号 JP19850179128 申请日期 1985.08.14
申请人 DAICEL CHEM IND LTD 发明人 HIGUCHI MASARU;TAKAHASHI SHIGEYUKI
分类号 B29C41/12;B29K1/00;B29L7/00;G03F1/00;G03F1/62;H01L21/027 主分类号 B29C41/12
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