发明名称 |
Appts. for X=ray examination with absorption filter - between source and object comprising 2 elements producing relatively low and high hardness increase in central area respectively |
摘要 |
<p>Appts. for X-ray examination of an object comprises an absorption filter (3) between the source (1) and the object to harmonise the spatial intensity distribution of the X-ray beam (5) after passing through the object. This filter consists of (at least) two separate filter elements (3a,b) pref. selected such that one (3b) produces a relatively small increase of the hardness (penetrating power) in the central area of the beam whilst the other (3a) produces a relatively large hardness increase in that area. The element (3b) may consist of Al2O3 with a thickness varying between 0 and 20 mm (bi-concave) whilst the other consists of Cu with a central thickness of 0.5 mm (bi-convex).</p> |
申请公布号 |
NL8502105(A) |
申请公布日期 |
1987.02.16 |
申请号 |
NL19850002105 |
申请日期 |
1985.07.23 |
申请人 |
N.V. PHILIPS' GLOEILAMPENFABRIEKEN TE EINDHOVEN. |
发明人 |
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分类号 |
G21K1/10;(IPC1-7):G21K1/10;A61B6/00;G21K3/00;G01N23/02 |
主分类号 |
G21K1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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