发明名称 Appts. for X=ray examination with absorption filter - between source and object comprising 2 elements producing relatively low and high hardness increase in central area respectively
摘要 <p>Appts. for X-ray examination of an object comprises an absorption filter (3) between the source (1) and the object to harmonise the spatial intensity distribution of the X-ray beam (5) after passing through the object. This filter consists of (at least) two separate filter elements (3a,b) pref. selected such that one (3b) produces a relatively small increase of the hardness (penetrating power) in the central area of the beam whilst the other (3a) produces a relatively large hardness increase in that area. The element (3b) may consist of Al2O3 with a thickness varying between 0 and 20 mm (bi-concave) whilst the other consists of Cu with a central thickness of 0.5 mm (bi-convex).</p>
申请公布号 NL8502105(A) 申请公布日期 1987.02.16
申请号 NL19850002105 申请日期 1985.07.23
申请人 N.V. PHILIPS' GLOEILAMPENFABRIEKEN TE EINDHOVEN. 发明人
分类号 G21K1/10;(IPC1-7):G21K1/10;A61B6/00;G21K3/00;G01N23/02 主分类号 G21K1/10
代理机构 代理人
主权项
地址