SOFT X-RAY LITHOGRAPHIC SYSTEM

摘要

Conventional soft X-ray lithographic system employing proximity exposure method is advanced by rendering the system feasibility of reductive projection method which has been proved of its merit in photo-lithography and the present inventive imaging system comprises basically a soft X-ray source which is emissive like a point source, a spherically concaved reflector to converge the soft X-ray onto a Fresnel zone plate (FZP) wherein a mask pattern or an original to be copied is positioned between the reflector and the FZP so that the soft X-ray will transmit through the mask pattern to form a reduced image or copy thereof on a resist coated target substrate. Therefore, the present invention will be most advantageously applied to patterning jobs in IC industry.