| 摘要 |
PURPOSE:To provide the titled composition consisting of a combination of a benzalacetophenone compound having a specific structure and an organic peroxide, having extremely high photopolymerization-initiation property, capable of increasing the initial rate of polymerization in the photopolymerization of an unsaturated compound and giving a photosensitive resin having high sensitivity. CONSTITUTION:The objective composition can be produced by compounding (A) the benzalacetophenone compound of formula (R1 and R2 are H, 1-4C alkyl, 1-4C alkoxy, phenyl, phenoxy, nitro, amino or halogen) (e.g. benzalacetophenone, nitrobenzalacetophenone, etc.) and (B) an organic peroxide [e.g. methyl ethyl ketone peroxide, 1,1-bis(t-butylperoxy)-3,3,5- trimethylcyclohexane, etc.] preferably at a weight ratio of (3-95):(97-5). |
