METHOD AND APPARATUS FOR CLEANING REACTION CHAMBER

摘要

PURPOSE:To thoroughly remove contaminants such as by-products of reaction in a short period and to clean a reaction chamber for film formation by evacuating the inside of the reaction chamber and blowing a gas to the surfaces deposited with the contaminants. CONSTITUTION:The contaminants such as fine powder polysilane as the by- products stick to the surface of a high-frequency electrode on the inside surface of the reaction chamber 1 in the stage of forming an amorphous silicon film, etc. on a substrate in the chamber 1. A gas supply device 2 for cleaning is inserted into the chamber 1 for removing the contaminants and the gas for cleaning such as N2 or Ar is introduced into the chamber through a supply port 26 so as to be blown from plural gas ejection ports 22 provided to a gas blow part 21 in the lower part through plural pieces of gas pipes 21 toward the inside surface of the electrode 4 deposited with the contaminants. The contaminants are thereby dislodged from the wall and are discharged together with the gas from a discharge port 8. The part 21 is vertically and rotationally moved by means of a motor 3, by which the contaminants are thoroughly removed from the entire inside surface of the electrode 4.