METHOD AND APPARATUS FOR CLEANING REACTION CHAMBER

摘要

PURPOSE:To quickly and thoroughly remove contaminants from the inside of a reaction chamber for thin film formation and to effectively clean the reaction chamber when the contaminants such as by-products of reaction stick to the inside surface of an electrode in the reaction chamber by utilizing a scraping member consisting of a net-wire cylindrical body. CONSTITUTION:The fine contaminants such as powdery polysilane stick to the surface of the high-frequency electrode 6 in the reaction chamber 1 in the stage of forming the thin film of amorphous silicon, etc. on the surface of the substrate in the chamber 1. The substrate on which the amorphous silicon film is formed is taken out of the chamber 1 to remove the contaminants and a scraping device 5 consisting of the wire-like member 51 which inscribes the inside surface of the electrode 6 and is rotated by a gear part 52 is rotated. The contaminants sticking to the surface of the electrode 6 are scraped by the sliding of the member 51 and are discharged together with the gas such as N2 or Ar blown out of a gas introducing pipe 2 from a discharge port 11. The inside of the chamber 1 is quickly and thoroughly cleaned.