| 摘要 |
<p>PURPOSE:To prevent cross talk between bits and to improve the reading resolu tion, by providing a photoconductive film having a higher resistance on its side faced to metallic electrodes, and by cutting off the photoconductive film positionally corresponding to a transparent conductive film so that the photoconductive film does not substantially protrude from the transparent conduc tive film in the portions faced to the metallic electrodes. CONSTITUTION:A transparent conductive film 4 is patterned into a comb shape by cutting off the portions between metallic electrodes 2, namely by removing the portions between bits, and a photoconductive film 3 is etched by the use of the transparent conductive film 4 as a mask. The portion of the photoconductive film 3 between each pair of metallic electrodes is removed such that no carrier is transferred to an adjacent bit through the photoconductive film 3, namely it is removed sufficiently to prevent cross talk between the adjacent bits. Consequently, the removed portion should have a width of 200mum or more. Since the photoconductive film 3 is thus formed not to project from the transparent conductive film 4 in its portion opposed to the metallic electrode 2, the light sensitivity is allowed to be independent from the area of the photoconductive film.</p> |
