| 摘要 |
PURPOSE:To perform the defectless plating in high velocity and high current density in case of plating the surface of a metallic strip with a radial type plating apparatus by bringing the strip into contact with the outside periphery in the vertical direction of a main roll and flowing a plating liquid from a lower part to an upper part between the main roll and an insoluble anode. CONSTITUTION:In a radial type plating apparatus, a metallic stripe 1 is brought into contact with the outside peripheral surface (side) in the vertical direction of a main roll 5 incorporated in a plating vessel 6 with the conductor rolls 4 and a deflector roll 7 and the main roll 5 is made to a cathode and rotated. The insoluble anodes 2 are provided to the outside of a part wherein the strip 1 is brought into contact with it in the side of the main roll 5 and a plating liquid is fed counter-currently to the running direction of the strip 1 to an upper part from a lower part with the nozzle headers 3. O2 generated from the anodes is quickly removed through the intervals of the strip 1 and the anodes 2 and the plating free from the appearance failure due to the ion burning and the adhesion of gaseous O2 is performed with the high current density.
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