| 发明名称 |
Pin lift plasma processing. |
| 摘要 |
<p>A wafer is supported on pins within a plasma reactor, allowing the plasma to act on both sides of the wafer. Various processes are disclosed for pins-up and pins-down condition. If conductive pins are used, they are preferably flattened. The wafer is preferably biased negatively with respect to the plasma.</p> |
| 申请公布号 |
EP0205142(A2) |
申请公布日期 |
1986.12.17 |
| 申请号 |
EP19860107855 |
申请日期 |
1986.06.09 |
| 申请人 |
TEGAL CORPORATION |
发明人 |
BITHELL, ROGER MARK;SLOMOWITZ, HARRY |
| 分类号 |
H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L21/677;(IPC1-7):H01J37/20 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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