发明名称 COMPOUND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor device and a manufacturing method of the same, which can achieve a normally-off operation while inhibiting current collapse.SOLUTION: A compound semiconductor device includes: an electron transit layer 3; a nitride semiconductor layer which is provided above the electron transit layer 3 and includes an electron supply layer 5 and an In-containing layer 6; and a gate electrode 11g, a source electrode 11s and a drain electrode 11d which are provided above the nitride semiconductor layer. The nitride semiconductor layer has a region having a smaller In composition than a region which contacts the electron transit layer 3 in a region located between the gate electrode 11g and the source electrode 11s, and in a region located between the gate electrode 11g and the drain electrode 11d in plan view.SELECTED DRAWING: Figure 1A
申请公布号 JP2016178325(A) 申请公布日期 2016.10.06
申请号 JP20160097368 申请日期 2016.05.13
申请人 FUJITSU LTD 发明人 KOTANI JUNJI
分类号 H01L21/338;H01L21/336;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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