发明名称 PHOTOGRAPHIC SENSITIVE MATERIAL
摘要 PURPOSE:To reduce increase of fog due to storage by forming a coating film of am electron beam hardenable resin composition incorporating a polymerization initiator, and hardening the film by irradiating electron beams. CONSTITUTION:The electron beam hardenable resin composition incorporating a polymerization initiator in an amt. of <=300 ppm of this composition. The polymerization initiator generally includes all the compounds to be added in order to suppress polymerization reaction during its synthesis and subsequent storage, and they are embodied by diphenylpicrylhydrazyl, garbinoxyl, ferdazyl, sulfur and the like, and each is used along or in combination of >=2 of them, and the polymerization initiator is determined quantitatively by gas chromatography or high speed liquid chromatography, etc., thus permitting increase of fog during storage to be prevented, and sharpness of a photographic image, smoothness of the surface of a support, and adhesion between the support and the coating layer to be improved.
申请公布号 JPS61284763(A) 申请公布日期 1986.12.15
申请号 JP19850125203 申请日期 1985.06.11
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 YAMAZAKI TOSHIAKI;WADA YOSHIHIRO
分类号 G03C1/79 主分类号 G03C1/79
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