| 摘要 |
PURPOSE:To allow a uniform deposition or etching process by a method wherein a table on which a material to be processed is placed and a floodlight are rotated relatively each other. CONSTITUTION:A table is constructed rotatable so that a wafer placed on the table and the light beam from a lighting optic system rotate relatively each other. A light source 1 of far ultraviolet light made by excimer laser is lit up, a light-flux l is focused on a rectangular slit 6 provided on a partition plate 3a through a cylindrical lens and then is distributed within the range of the angle of elevation + or -theta for the light-flux. The light proceeds parallel to the surface of the wafer 5 above the wafer 5. The nitrogen gas or inactive gas G1, etc. is selected and introduced into a protective chamber A from an inlet pipe 7, and a part of it is discharged as a discharge gas G4 through an outlet pipe 10. The other part of it flows into a reaction chamber B through the slit 6 provided on the partition plate 3a, thereby allowing a uniform deposition or etching process.
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