发明名称 FLOW QUANTITY SENSOR
摘要 <p>PURPOSE:To obtain a thermal flow quantity sensor available for performance of high productivity, uniformity and stability at high temperature, by forming a heat-generating resistance elements with metallic film shaped in a pattern represented on a flat insulating plate. CONSTITUTION:Platinum thin film is formed on an alumina substrate 1 by a sputtering method and later, annealing treatment is effected at high temperature for stabilization of resistance characteristic of the platinum thin film. Next, a resistance pattern is formed on the platinum film by a photolithographic process and on etching treatment is conducted on the platinum film by a sputter- etching method using the resistance as a mask. After etching, oxygen-plasma ashing method is applied for peeling the resistance off. By above processes, a zigzag pattern of the platinum thin film resistance wire 2 of the specified resistance can be obtained. The pattern of the wire 2 on the alumina substrate 1 can serve as heat-generating element or temperature-measuring resistance element.</p>
申请公布号 JPS61274222(A) 申请公布日期 1986.12.04
申请号 JP19850119103 申请日期 1985.05.30
申请人 SHARP CORP 发明人 TANAKA JUNICHI
分类号 G01F1/68;G01F1/692 主分类号 G01F1/68
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