| 摘要 |
PURPOSE:To form a film on a substrate by polymerizing starting monomers which have different probabilities of adhering to the substrate at a stoichiometric composition ratio, by evaporating at least two starting monomers in a vacuum treatment chamber under conditions in which the temperature in the chamber and that of the substrate in the chamber are specified. CONSTITUTION:At least two starting monomers are evaporated in a vacuum treatment chamber and polymerized on a substrate to form a synthetic resin film. The degree of vacuum in the chamber is set at about 1-1X10<-2>Torr. The temperature of the substrate is set at a temperature higher than the highest of the evaporation temperatures of the starting monomers and the temperature of the inside wall of the chamber is set at a temperature higher than the temperature of the substrate. When the starting monomers are evaporated under such temperature conditions, their polymerization can be completed on the substrate at a stoichiometric composition ratio, because each monomer does not adhere singly to the substrate even when contacted with the substrate and adheres thereto after some polymerization takes place by collision among the monomers.
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