发明名称 LASER LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To attain the miniaturization of memories and the improvement of working efficiency while remarkably reducing the volume of data to be prepared preliminarily by a method wherein a data converter and multiple buffer memories are provided while geometric pattern data are converted into bit data to draw patterns. CONSTITUTION:A specimen stage 11 whereon a specimen 12 is placed is shifted in Y direction to be scanned by laser beams for drawing of a pattern. At this time, the laser beams are changed to surface side by using an AO element 24 and then pattern data are converted into bit data by a control system 50 to draw pattern on the surface of specimen by ruster scanning process by means of turning polygon mirror 26a synchronized with shifting stage to supply the AO element 22 with blanking data. In other words, photoresist etc. coated on the specimen 12 are exposed corresponding to the circuit pattern of PCB to be drawn. After the drawing pattern on the surface is finished, the specimen stage 11 is reversely shifted in -Y direction while changing the laser beams to backside likewise to draw pattern on the backside of specimen 12.
申请公布号 JPS61251032(A) 申请公布日期 1986.11.08
申请号 JP19850091173 申请日期 1985.04.30
申请人 TOSHIBA MACH CO LTD 发明人 TANAKA SHOJI;SUZUKI AKIRA;KAWACHI YASUNOBU
分类号 H05K3/00;H01L21/027;H01L21/30 主分类号 H05K3/00
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