| 摘要 |
PURPOSE:To improve the processing capacity enabling to draw an image directly from a circuit pattern by a method wherein the operations of aperture part and stage part are controlled by drawing data while a contraction lens system is provided with an optical system for alignment 107. CONSTITUTION:A substrate holding base 102 to be mounted with a semiconductor substrate is provided on a stage 101 quardratically movable in XY direction. Beams from a mercury lamp used as an exposing light source are converged by a condenser lens 104 to draw a slit image by an aperture part 105 for irradiating a semiconductor substrate passing through a contraction lens system 106. The aperture part 105 is actuated to make width W, height H and an angle theta of slit image variable while the stage 101 is made movable along two axes XY so that the movement amount may be measured accurately by a laser interferometer. Through these procedures, the title pattern generator can control the operations of the aperture part 5 and the stage 101 by drawing data to form circular pattern while automatically controlling the operation of stage 101 by the laser interferometer. |
