| 摘要 |
PURPOSE:To enable to easily discriminate the type of products when an exposing process is performed by a method wherein the discriminating mark indicating the condition of exposure required for the manufacture of a semiconductor device is exposed on the semiconductor substrate, and a device with which the discriminating mark is identified is provided separately form the exposing system of a semiconductor element pattern. CONSTITUTION:In a semiconductor element pattern exposing system, the luminous flux emitted from an exposure illumination optical system 1 is focussed by a condenser lens 2, the focussed light is made to irradiate on a mask 3, the transmitted light is reduced by a reduced projection lens 4, and it is made to irradiate and exposed on the semiconductor substrate 6 located on a stage 5. The two-dimentional movement is performed by the stage 5. The beam-formed light emitted from an exposure illumination optical system 8 is scanned by a reflecting diaphragm 7, and a bar code 14 is exposed on the semiconductor substrate 6 in combination with the opening and the closing of an illumination light source. Said bar code 14 is identified in the next process utilizing the reflected light of a laser beam. The beam emitted from a laser beam generating source 9 is scanned by a reflecting diaphragm 10, the beam is focussed by an objective lens 13, it is made to irradiate on the bar code 14, and the reflected beam is introduced to a detector 11 using a reacting plate 12. |
