发明名称 Data handling system for a pattern generator
摘要 This data processing system for a pattern generator receives data specifying each quadrilateral element in a pattern to be generated by laser scanning or other technique. The scanning is accomplished by swaths. In the preprocessor, separate vectors are produced for the portion of each quadrilateral edge in each swath. A real time processor, including a "pipeline" or cascaded set of beam processors, is used to generate a bit map from these clipped edge vectors. The bit map itself is skew compensated to take into account relative movement between the laser scanner and the target during pattern generation.
申请公布号 US4620288(A) 申请公布日期 1986.10.28
申请号 US19830545650 申请日期 1983.10.26
申请人 AMERICAN SEMICONDUCTOR EQUIPMENT TECHNOLOGIES 发明人 WELMERS, THOMAS E.
分类号 B23K26/00;G03F1/08;G03F7/20;H01L21/027;H01L21/30;H04N1/113;(IPC1-7):G06K15/00 主分类号 B23K26/00
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