发明名称 ION IMPLANTING APPARATUS
摘要 PURPOSE:To enable accurate measurement of the incident angle of ion beam against specific referential axis by directing the ion beam passed through first slip board having an opening through second slit board to a beam detector. CONSTITUTION:Upon irradiation of ion beam 4 against a slit board 10, the beam 4 passed through the opening 10a of said board 10 will advance straight toward a beam detector 12, Here, the beam 4 is blocked by a slit board 13 and never reach to the detector 12. Upon motion of the board 13 through drive mechanism, the beam 12 will reach to the detector only when the irradiating position of beam 4 will match with the opening 13 a of the board 13 thus to detect the ion current through a beam current meter. When reading the position of the board 13 to calculate the displacement from the basic axis 14 vertical against the surface of the board 10 on the basis of said reading, the incident angles theta1, theta2 of beam 4 against the basic axis can be obtained.
申请公布号 JPS61232546(A) 申请公布日期 1986.10.16
申请号 JP19850073219 申请日期 1985.04.06
申请人 SONY CORP 发明人 SUZUKI TOSHIHARU;KASAHARA JIRO
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
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